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Negative Resist Developer

Philmore ER8 Negative Resist Developer

The Philmore ER8 Negative Resist Developer is an essential chemical solution used for developing etched printed circuit boards (PCBs). This developer ensures precise and clear development of the negative photoresist applied on PCBs during the etching process. It is formulated to offer consistent results, making it a crucial supply for electronics professionals and hobbyists working on custom PCB designs.

Key Features

  • Type: Negative Resist Developer
  • Application: Suitable for developing all standard negative photoresists
  • Volume: Available in various sizes to suit different project scales
  • Consistency: Ensures high clarity and precision in resist development
  • Ease of Use: Simple application process compatible with typical PCB fabrication methods

Usage Scenario

The ER8 Developer is used after the exposure of negative photoresist-covered PCBs to ultraviolet light. It accurately develops the exposed areas, ensuring that the unexposed resist remains intact for the subsequent etching process. This product is ideal for intricate PCB designs where precision is paramount.

Authorized Distributor

Tri-Tek Electronics is an authorized distributor of Philmore Manufacturing products. Customers purchasing from us are guaranteed full manufacturer warranty coverage, the best pricing, and comprehensive factory support.

Philmore’s ER8 Negative Resist Developer is designed to maximize efficiency and reliability in PCB fabrication, making it highly valuable for technicians and installers focused on creating high-quality electronic components. Its dependable performance and ease of use ensure that professionals can achieve precise circuit layouts, critical for the functionality of custom electronics.

This developer is a key component in the PCB manufacturing process, providing the accuracy and reliability needed for effective photoresist development.

Product form

Philmore ER8 Negative Resist Developer The Philmore ER8 Negative Resist Developer is an essential chemical solution used for developing etched... Read more

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SKU: PHIER8
UPC: 9

1 in stock

$17.99 $5.00

      Philmore ER8 Negative Resist Developer

      The Philmore ER8 Negative Resist Developer is an essential chemical solution used for developing etched printed circuit boards (PCBs). This developer ensures precise and clear development of the negative photoresist applied on PCBs during the etching process. It is formulated to offer consistent results, making it a crucial supply for electronics professionals and hobbyists working on custom PCB designs.

      Key Features

      • Type: Negative Resist Developer
      • Application: Suitable for developing all standard negative photoresists
      • Volume: Available in various sizes to suit different project scales
      • Consistency: Ensures high clarity and precision in resist development
      • Ease of Use: Simple application process compatible with typical PCB fabrication methods

      Usage Scenario

      The ER8 Developer is used after the exposure of negative photoresist-covered PCBs to ultraviolet light. It accurately develops the exposed areas, ensuring that the unexposed resist remains intact for the subsequent etching process. This product is ideal for intricate PCB designs where precision is paramount.

      Authorized Distributor

      Tri-Tek Electronics is an authorized distributor of Philmore Manufacturing products. Customers purchasing from us are guaranteed full manufacturer warranty coverage, the best pricing, and comprehensive factory support.

      Philmore’s ER8 Negative Resist Developer is designed to maximize efficiency and reliability in PCB fabrication, making it highly valuable for technicians and installers focused on creating high-quality electronic components. Its dependable performance and ease of use ensure that professionals can achieve precise circuit layouts, critical for the functionality of custom electronics.

      This developer is a key component in the PCB manufacturing process, providing the accuracy and reliability needed for effective photoresist development.

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